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    Basic Information

Technology developed: Variable gaseous plasma focused ion beams and creation of high aspect ratio microstructures (TP19767700878)
Category: Product(Hardware/Material/Software)
Details of Inventor(s):
Inventor Institution/Organization/Company Department Designation
Dr Sudeep Bhattacharjee Indian Institute of Technology (IIT) Kanpur
Technical Application Area: Electronics & Semiconductors
If 'Other', please specify:
Please give more details of new technical application area:
Organization(s):
Indian Institute of Technology (IIT) Kanpur
Affiliated Ministry: Institution Funding (Self Supported)
Type of technology development: Indigenous
Does the technology help in replacing any import items currently
procured from outside India?
Yes
Does the technology have export potential? Yes
Category of Technology developed: Immediate Deployment
Stage of Development: Prototype Level
Please describe in detail including the TRL Level:
Ready

    Abstract:

Applications: Ion beam tools have become inevitable in todays science and technology research and industrial applications. The application spans over several areas and traditionally have addressed milling, patterning, high resolution imaging and implantation, including fundamental physics research.
Advantages: In order to serve emerging research applications, there are efforts to develop ion beam tools that use gaseous plasmas, which can be non toxic and therefore suitable for biomaterials and provide an option for rapid processing due to higher currents without metallic contamination. To mention a few, ion beam processing of polymer biomaterials e.g. polyurethane and silicon rubber are becoming increasingly important for applications in artificial heart valves. The surface properties of metallic bio materials such as titanium or titanium alloys and cobalt chromium alloys Co Cr used in orthopedic prostheses, can be improved by employing nitrogen ion beams which reduces wear and tear. For microfluidic applications sometimes network of channels are required in the micro meter regime. As a possibility to address the above requirements, a microwave plasma based multi element ion beam system has been developed, that can deliver ion beams of different gaseous elements e.g. Ar, Kr, Ne, H2 with the present capability of focusing the beam down to single digit in micrometers.

    Technology Inputs:

Imported Equipment/Spare Parts:
Equipment/Spare Parts Year ITC-HS Code
NA
Indigenous Equipment/Spare Parts:
Equipment/Spare Parts Year ITC-HS Code
NA
Imported Raw Materials:
Raw Materials Year ITC-HS Code
NA
Indigenous Raw Materials:
Raw Materials Year ITC-HS Code
NA
Existing R&D Facilities used:
Facilities Year ITC-HS Code
NA

   Patents & Publications:

Patents:
Filed Patents (No.) Granted Patents (No.) Year
0 0 NA
Publications:
Submitted (No.) Published (No.) Year
0 0 NA

    Commercialization Potential:

Who are the Potential Licensees?
What commercially available products address
the same problem?
Company Product Problem Addressed
Would you like to develop this invention further with
corporate research support?
Yes
Would you be interested in participating in cluster based
programs for commercialization research or business
planning for your invention?
Yes
      Submitted by: Pooja Punetha Date of Submission: 1-5-2023



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