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    Basic Information

Technology developed: A device for pressurized multiphase flow during electro-chemical discharge machining process (TP19769888208)
Category: Product(Hardware/Material/Software)
Details of Inventor(s):
Inventor Institution/Organization/Company Department Designation
Dr. Akshay Dvivedi Indian Institute of Techonology Roorkee Department of Mechanical and Industrial Engineerin Associate Professor
Dr. Rajendra Kumar Arya Indian Institute of Techonology Roorkee Department of Mechanical and Industrial Engineerin Research Scholar
Technical Application Area: Mechanical Engineering
If 'Other', please specify:
Mechanical Engineering
Please give more details of new technical application area:
Electrochemical discharge machining (ECDM) process is capable to fabricate micro holes on different materials, mostly on non-conductive materials. However, the high aspect-ratio of drilled micro holes is limited due to absence of electrolyte and gathering of machined by-products like sludge, molten salt and debris inside the machining zone, at higher depth. The developed device (i.e., Pressurized Multiphase Flow device) enables the drilling of high aspect-ratio micro holes on various difficult-to-machine materials by using it with ECDM process. This device provides fresh working electrolyte flow into the machining zone and removal of machined by-products from the machining zone. Incorporation of innovative device with ECDM process can be utilized for drilling of micro holes on other difficult to machine materials. The technical application area may be fabrication of MEMS and microfluidic devices.
Organization(s):
Indian Institute of Technology (IIT) Roorkee
Affiliated Ministry: Ministry of Education
Type of technology development: Indigenous
Does the technology help in replacing any import items currently
procured from outside India?
Yes
Does the technology have export potential? Yes
Category of Technology developed: Immediate Deployment
Stage of Development: Prototype Level
Please describe in detail including the TRL Level:
The Prototype of the device is ready to demonstrate its work. We have performed various set of experiments using the developed device. Incorporation of developed device with conventional ECDM facility provided amazing results by drilling deepest micro hole on glass material.

    Abstract:

Applications: MEMS Microfluidic devices Bio devices Lab-on-a-chip devices Micro-electronics
Advantages: Higher Material Removal Rate High aspect ratio micro holes can be fabricated in variety of materials High quality deep holes can be fabricated The ECDM process after incorporating the developed device is not limited to any group of engineering materials

    Technology Inputs:

Imported Equipment/Spare Parts:
Equipment/Spare Parts Year ITC-HS Code
NA
Indigenous Equipment/Spare Parts:
Equipment/Spare Parts Year ITC-HS Code
8 2017-18
Imported Raw Materials:
Raw Materials Year ITC-HS Code
NA
Indigenous Raw Materials:
Raw Materials Year ITC-HS Code
NA
Existing R&D Facilities used:
Facilities Year ITC-HS Code
ECDM facility 2017-18

   Patents & Publications:

Patents:
Filed Patents (No.) Granted Patents (No.) Year
2147483647 0 2019-20
Publications:
Submitted (No.) Published (No.) Year
0 0 NA

    Commercialization Potential:

Who are the Potential Licensees? No specific ones
What commercially available products address
the same problem?
Company Product Problem Addressed
Nil
Would you like to develop this invention further with
corporate research support?
Yes
Would you be interested in participating in cluster based
programs for commercialization research or business
planning for your invention?
Yes
      Submitted by: Sai Ramudu Meka Date of Submission: 5-8-2020



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